"CHIPS: Lithogrphy leap creates 20nm chip" genre: Technology
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	Professor James Taylor at the University of Wisconsin describes a way to create 20-nanometer chip feature sizes with 100-nm masks, giving an unexpected leap to Moore's Law and possibly extending the life of current lithography. The so-called "bright-peak technology" adjusts the phase of X-ray lithography to control diffraction — a technique that works for X-rays or even traditional optical lithography. The work was performed with professor Franco Cerrina and researcher Lei Yang.
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	Story Behind the Song Source interview for a story in EE Times: http://www.eet.com/semi/news/OEG20030117S0038

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